Name: ASML 如何利用價值 4 億美元的新型高 NA 機器快速製造芯片 (How ASML Makes Chips Faster With Its New $400 Million High NA Machine)
Uploaded: 2025-05-27T22:13:26.000Z
Duration: 17 min 25 s

All right, we're about to enter the high and A-level.

好了，我們即將進入高中和聯考。

程度副詞

Behind this highly secured door in an ASML cleanroom, there's a giant $400 million machine.

在 ASML 潔淨室這扇高度安全的門後面，有一臺價值 4 億美元的巨型機器。

Made with such closely protected technical specificity.

以如此嚴密的保護技術特性製作而成。

Very complex, the most advanced machine tool in history.

非常複雜，是歷史上最先進的機床。

That no filming's ever been allowed, even by ASML's own team, until we flew across the world to see it.

即使是 ASML 自己的團隊也從未允許過拍攝，直到我們飛越地球去看它。

We're here at ASML's headquarters in the Netherlands, where 100% of the world's extreme ultraviolet lithography machines are made.

我們這裡是 ASML 位於荷蘭的總部，全球 100% 的極紫外光刻設備都是在這裡製造的。

And now the next generation machines called HiNA.

現在，下一代機器被稱為 HiNA。

We had to wear these bunny suits to protect these extremely precise machines from getting contaminated by our own hair and skin cells.

我們必須穿上這些兔子服，以保護這些極其精密的機器不被我們自己的頭髮和皮膚細胞汙染。

This is HiNumerical Aperture, HiNA, the new generation of EUV machines.

這是新一代 EUV 機器 HiNumerical Aperture（HiNA）。

The only machines in the world capable of printing nanoscopic blueprints onto the most advanced chips.

世界上唯一能夠將納米藍圖打印到最先進芯片上的機器。

NVIDIA, Apple, Taiwan Semiconductor, Samsung, Intel, none of their advanced chips can be made without EUV.

英偉達、蘋果、臺灣半導體、三星、英特爾等公司的先進芯片都離不開 EUV。

And this company has that market completely cornered.

這家公司完全佔領了這一市場。

The first HiNA machine was installed in the U.S. at Intel's Oregon Chip Fabrication

第一臺 HiNA 機器安裝在美國英特爾公司的俄勒岡芯片製造廠。

Indeed, the machine is so big you can't ship it in once.

的確，這臺機器太大了，一次運不過來。

是以，我們把它們抽成幾個部分。

Now they're being ramped up to make millions of chips on the factory floors of the few companies that can afford them.

現在，它們正在加緊生產，以便在少數有能力的公司的工廠工廠中的房間裡製造數百萬個芯片。

ASML says eventually HiNA will be used by all its EUV customers, other advanced chipmakers like Micron, SK Hynix and Rapidus.

ASML 表示，HiNA 最終將被其所有 EUV 客戶以及美光、SK 海力士和 Rapidus 等其他先進芯片製造商採用。

Without EUV, without very advanced logic manufacturing, most probably AI cannot happen.

沒有 EUV，沒有非常先進的邏輯製造技術，人工智能很可能無法實現。

CNBC went from ASML's labs in California all the way to its Veldhoven, Netherlands headquarters to bring you this never-before-seen look at the world's most advanced chipmaking machine and to ask its makers exactly how it works and what could go wrong amidst Trump's tariffs, export controls and a new training facility coming to the U.S.

CNBC 從 ASML 位於加利福尼亞州的實驗室出發，一路來到其荷蘭 Veldhoven 總部，為您帶來前所未見的世界最先進芯片製造機器的全貌，並向其製造商詢問它究竟是如何工作的，以及在特朗普的關稅、出口管制和即將在美國建立的新培訓設施的背景下可能出現的問題。

It's basically to blow off all the contamination from your suit and your clothes.

這基本上是為了吹走西裝和衣服上的所有汙染物。

On several long hallways where humongous parts are being meticulously moved.

在幾條長長的走廊上，巨大的部件被一絲不苟地搬運著。

How many people would you say are working here 24-7?

你認為有多少人全天候在這裡工作？

Inside the EUV factory alone, it's like 2,000 people.

僅 EUV 工廠內部就有 2000 多人。

Essia Haddou took us to the restricted lab space where 40 years of ASML's technology research all comes together.

Essia Haddou 帶我們參觀了 ASML 40 年來的技術研究成果全部彙集的受限實驗室空間。

It takes approximately a year and a half to create this system.

創建這個系統大約需要一年半的時間。

Haddou leads the team that tests and qualifies the HiNA machines here.

哈杜帶領團隊在這裡對 HiNA 機器進行測試和鑑定。

I think even if you learn more about it, it blows your mind even more.

我想，即使你瞭解得更多，你也會更加震驚。

The big machine, at the end of the day, is used to transfer a pattern, which we store on a mask, onto a wafer.

最後，大型機器用於將我們存儲在掩膜上的圖案轉移到晶片上。

And then at the end of the day, you cut them in pieces, you package them and then you end up in your phone.

然後在一天結束時，你把它們切成一塊一塊的，包裝好，最後就會出現在你的手機裡。

Joost Benschap joined Dutch electronics giant Philips in 1984.

約斯特-本夏普於 1984 年加入荷蘭電子巨頭飛利浦公司。

Two weeks later, ASML was founded as a subsidiary, conducting research out of a leaky shed nearby in Eindhoven.

兩週後，ASML 子公司成立，在埃因霍溫附近一個漏雨的棚子裡開展研究。

Haddou broke off from Philips with an IPO in 1995.

1995 年，哈杜通過首次公開募股與飛利浦脫離關係。

And two years later, Benschap helped spearhead ASML's first foray into EUV.

兩年後，Benschap 幫助 ASML 首次涉足 EUV 領域。

Three, four years later, we had enough confidence to put all our eggs in one basket called EUV.

三四年後，我們有了足夠的信心，把所有的雞蛋都放在一個叫 EUV 的籃子裡。

With hindsight, we can say we placed the right bet.

事後看來，我們可以說賭對了。

On a yearly basis, I think we filed several hundred of patents on EUV.

我想我們每年都會申請數百項有關 EUV 的專利。

Christophe Fouquet began as CEO just over a year ago, but he's been with ASML more than 17 years.

Christophe Fouquet 一年多前才開始擔任首席執行官，但他在 ASML 的工作時間已超過 17 年。

I think sometimes people forget that, but EUV took us practically more than 20 years.

我想有時人們會忘記這一點，但 EUV 實際上花了我們 20 多年的時間。

I would say it's been a very risky investment because when we started, well, there was no guarantee the technology would work.

我想說這是一項非常冒險的投資，因為在我們開始的時候，根本無法保證這項技術能夠成功。

By 2018, ASML had shown that EUV was possible.

到 2018 年，ASML 已證明 EUV 是可行的。

And it's the same process used in high N.A.

Chips are built in a grid formation on thinly sliced wafers of silicon, each with up to 100 thin layers that make up billions of transistors that determine what the chips can do.

芯片是在薄薄的硅片上以柵格陣列方式構建的，每片硅片上有多達 100 個薄層，這些薄層組成了數十億個半導體，決定了芯片的功能。

These layers are printed using lithography, extremely precise rays of light projected through a mask of the chip design until they hit the surface of the wafer that's been coated with photoresist chemicals.

這些層是通過光刻技術打印出來的，極其精確的光線通過芯片設計的掩膜投射到塗有光致抗蝕劑的晶片表面。

ASML's older generation DUV machines, which it still makes, use rays of deep ultraviolet light with a wavelength of 193 nanometers.

ASML 仍在生產的老一代 DUV 機器使用波長為 193 納米的深紫外線。

Nikon and Canon in Japan are still competitors in DUV.

日本的尼康和佳能仍然是 DUV 領域的競爭對手。

But ASML's real breakthrough came with that bold bet on a technology many thought was impossible, using even shorter wavelength extreme ultraviolet light, EUV, something that to this day, no other company does.

但是，ASML 的真正突破來自於對一項許多人認為不可能實現的技術的大膽嘗試，即使用波長更短的極紫外光（EUV）。

A few more people tried for many years, but the size of the investment, the commitment you have to have, I think discouraged quite a few people.

還有一些人嘗試了很多年，但我認為，投資的規模和你必須做出的承諾讓很多人望而卻步。

Transistors have gotten so small, down to 10,000 times thinner than a human hair, that

半導體已經變得如此之小，比頭髮絲還要細一萬倍，以至於

ASML decided to create its own source of smaller, more precise EUV light.

ASML 決定創建自己的更小、更精確的 EUV 光源。

At a wavelength of 13.5 nanometers, it's the width of just five DNA strands laid side-by-side.

它的波長為 13.5 納米，寬度僅相當於五條並排放置的 DNA 鏈。

So small that it gets absorbed by almost everything.

And that's why this whole system needs to be in a vacuum.

這就是為什麼整個系統需要處於真空狀態。

This tiny thread may look like the strand of a spiderweb, but it's actually molten tin being shot out at 50,000 droplets a second.

這根細線看似蜘蛛網的一縷，但實際上是熔錫以每秒 50,000 滴的速度噴射出來。

The tin droplets are vaporized with a laser, and those tiny explosions are what emit photons of EUV light.

錫滴在脈衝光的作用下被蒸發，這些微小的爆炸就會發出極紫外光的光子。

It's been used in the car industry for many years.

They would cut through steel with one of these.

他們可以用這種東西切割鋼鐵。

We use four of them to shoot at one of these tiny tin droplets to generate a plasma, which is hotter than the sun.

我們用四個發射器向其中一個小錫滴發射，產生比太陽還熱的等離子體。

That plasma generates EUV, and that EUV is captured by this collector mirror that comes from Goudsize and brings the light into our scanner.

等離子體會產生超紫外線，而超紫外線會被來自 Goudsize 的集光鏡捕捉，並將光線帶入我們的掃描儀。

The light bounces off of mirrors that aim it through the lens, much like how a camera works.

光線在鏡面上反彈，鏡面將光線對準鏡頭，就像照相機的工作原理一樣。

Because EUV gets absorbed by typical mirrors, German optics company Zeiss made specific mirrors just for ASML that are the flattest man-made surfaces in the world.

由於普通反射鏡會吸收 EUV，德國光學公司蔡司專門為 ASML 製造了特殊的反射鏡，這是世界上最平坦的人造表面。

And then the light is emitted through the projection optics onto the wafer, which is about here.

然後，光線通過投影光學元件發射到晶片上，也就是這裡。

When the EUV finally hits photoresist chemicals on the surface of the silicon wafer, it prints the minuscule blueprint that makes up the chip.

當紫外線最終照射到硅晶片表面的光刻膠化學物質上時，就會打印出構成芯片的微小藍圖。

The aim needs to be so precise, TSMC says it's equivalent to shining a laser from the moon to hit a coin on the earth.

臺積電表示，瞄準需要非常精確，這相當於用脈衝光從月球照射地球上的一枚硬幣。

EUV made up less than 8% of ASML's total number of machines sold in 2024.

2024 年，EUV 佔 ASML 售出機器總數的比例不到 8%。

44 EUV machines versus 374 cheaper DUV machines.

44 臺 EUV 設備與 374 臺廉價的 DUV 設備相比。

But with a price tag of $220 million, EUV made up 38% of ASML's system sales revenue.

但 EUV 的價格高達 2.2 億美元，佔 ASML 系統銷售收入的 38%。

The cost of the chips the tool is going to create is going down.

該工具要製造的芯片成本正在下降。

Because you're the only company in the world that makes these machines, what's stopping you from setting the price even higher?

因為你們是世界上唯一一家生產這種機器的公司，有什麼能阻止你們把價格定得更高？

Well, what stopped us is Moore's law says that we need to continue to drive costs down.

阻止我們前進的是摩爾定律，即我們需要繼續降低成本。

This allows you to go to the next node and then the next node and then again the next node.

這樣就可以轉到下一個節點，然後再轉到下一個節點，然後再轉到下一個節點。

If this was to stop, then everyone gets stuck.

如果這一切停止，那麼每個人都會陷入困境。

ASML began developing its latest $400 million HiNA machines around 2016.

ASML 於 2016 年左右開始研發最新的耗資 4 億美元的 HiNA 機器。

Inside, all the same processes still happen with the same EUV light source.

在內部，所有相同的過程仍然使用相同的 EUV 光源。

We increased the aperture of the opening angle of the lens.

我們增大了鏡頭開口角度的光圈。

HiNA stands for high numerical aperture, meaning it has a larger lens opening, increasing the angle at which the light is captured by the mirrors.

HiNA 是高數值孔徑的縮寫，這意味著它的鏡頭開口更大，增加了反射鏡捕捉光線的角度。

More light coming in from steeper angles allows HiNA machines to capture increasingly small designs on chip masks so they can be projected in one exposure step, whereas original lower NA machines reach higher resolution to project these tiny designs using multiple exposures through multiple masks.

從陡峭角度射入的光線越多，HiNA 機器就能在芯片掩膜上捕捉到越來越小的設計，這樣就能在一次曝光步驟中將其投射出來，而原來的低 NA 機器則能達到更高的分辨率，通過多個掩膜進行多次曝光來投射這些微小的設計。

One becomes two, then two becomes three, three becomes four.

And when the number increases, it gets very complex process-wise and the yield goes down.

當數量增加時，工藝就會變得非常複雜，產量也會下降。

But with a higher NA, resolution improves and the small designs can be printed with fewer masks, saving time and money.

但 NA 越高，分辨率就越高，小設計可以用更少的掩膜進行印刷，從而節省時間和金錢。

The larger the number, the smaller the thing you can print.

數字越大，可以打印的東西就越小。

But this higher NA also comes with a much higher price tag for one main reason.

但是，由於一個主要原因，這種更高的 NA 也帶來了更高的價格。

The higher the NA of an optic, the bigger the mirror you have to use and therefore the bigger the system.

光學器件的 NA 越大，需要使用的反射鏡就越大，是以系統也就越大。

These machines also take up a huge amount of power.

If we don't improve the power efficiency of our AI chips over time, the training of the models could consume the entire worldwide energy.

如果我們不能逐步提高人工智能芯片的能效，那麼模型的訓練可能會消耗掉全球的全部能源。

Since the moment we started EUV in 2018, we have reduced the power, the energy needed per wafer exposure by more than 60 percent.

自 2018 年啟動 EUV 以來，我們已將每個晶圓曝光所需的功率和能量降低了 60% 以上。

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ASML 如何利用價值 4 億美元的新型高 NA 機器快速製造芯片 (How ASML Makes Chips Faster With Its New $400 Million High NA Machine)

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